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RESEARCH ARTICLE

Finite Element Analysis of Neonatal Skull Stress During 3D Printed Nasoalveolar Molding Therapy for Cleft Lip and Palate

The Open Dentistry Journal 23 June 2025 RESEARCH ARTICLE DOI: 10.2174/0118742106386858250617103542

Abstract

Introduction

Orofacial clefts, including Cleft Lip and Palate (CLP), are common congenital disabilities that often require non-surgical treatments like Nasoalveolar Molding (NAM) therapy. This study aimed to assess stress distribution and potential deformation in both the viscerocranium and neurocranium of a 17-day-old neonate skull with unilateral cleft lip and palate using Finite Element Analysis (FEA) under different applied forces.

Methods

This research was conducted in Erbil province from August 2024 to November 2024. MIMICS, 3-Matic Medical, and ANSYS programs were used to determine the effects of Nasoalveolar Molding (NAM) therapy on cranial and facial structures. This study included neonates who were 17 days old, diagnosed with nonsyndromic unilateral cleft lip and palate, and had a normal head circumference.

Results

The results showed varying von Mises stress distributions, with maximum stress values of 77,053 Pa at 0.75 N, which exceeded the deformation threshold of 30,000 Pa, indicating potential viscerocranial deformation. Lower forces (0.65 N and 0.70 N) remained below this threshold.

Discussion

The study confirmed that forces exceeding 30,000 Pa during Nasoalveolar Molding (NAM) therapy led to potential deformation in the neonatal viscerocranium. Finite element analysis showed that a force of 0.75 N generated stress above this threshold.

Conclusion

The applied force during Nasoalveolar Molding (NAM) therapy plays a crucial role in preventing craniofacial deformation in neonates with unilateral cleft lip and palate. Therefore, managing force levels in Nasoalveolar Molding (NAM) therapy is essential to avoid potential long-term deformation.

Keywords: Finite element analysis (FEA), Nasoalveolar molding (NAM), Unilateral cleft lip and palate, Von mises stress.
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